Applications
Cubo is not about doing what a conventional ellipsometer already does well. It is about the work that was out of reach when a measurement took seconds and the instrument was benchtop-sized.
In-situ process monitoring
Record how film thickness evolves during deposition or etching at more than 20 samples per second — the time-axis data that post-process measurement cannot recover.
Portable metrology
Instead of carrying the sample to the instrument, carry the instrument to the sample. Useful for samples that cannot leave their environment, and for on-site inspection.
Everyday lab metrology
Measure when you need to, without queuing for shared equipment. For a group that deposits films often, the measurement frequency itself changes.
Multi-point setups
Several units cost what one conventional instrument costs, which makes monitoring multiple points at once a practical option.
Measurable samples
Validated today on SiO₂ over Si, across thicknesses from a few hundred nm to a few µm. Libraries for Si₃N₄, Al₂O₃ and PR are in development, targeted for launch.
Is your sample not on the list?
Tell us the layer structure and thickness range and we will review whether it can be measured.
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